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http://www.dentonvacuum.com/ |
Ion sourcesThe high quality requirements of today's optical thin films can only be met using ion-assisted processes, he most widely used being ion assisted evaporation (IAD).The core component of this process is the ion source. It has to provide the required current densities and run stably and reliably at the same time also during long deposition runs. Furthermore, the source should be compact and maintenance-friendly. For these applications Denton Vacuum have been manufacturing their patented cold cathode ion sources of the CC series for many years. They are designed particularly for operation with pure Oxygen. The current model CC-105 is the most powerful and at the same time most compact model of this series. Using the CC-105 shift-free optical films can be prepared in chambers up to ca. 1 m diameter. The CC-105 is used by both coating companies (e. g. Bte) and OEM's (e. g. Pfeiffer). The fact of the CC-105 being very reliable particularly under harsh production conditions has been a decisive factor in the purchase decision of many of our CC-1105 customers. |
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The well known Laserzentrum Hannover (LZH)
uses the CC-105 for the development and preparation
of high performance coatings for laser applications. Within the frame of this work the CC-105
has been thoroughly characterized. During this characterization work the capabilities in
different chambers (e. g. BAK 760) were demonstrated. Shift-free coatings (with the exception
of thermal expansion) which do not absorb any water are now prepared on a routine basis. To be able to also equip systems larger than 1 m with a single cold cathode ion source (dual sources have been successfully used in many cases before) Denton Vacuum are presently developing the more powerful model CC-206. It will produce sufficient current densities for systems up to 1.5 m diameter. The CC-206 is being optimized in the frame of the national R&D project IntIon. This project is being coordinated by the Laserzentrum Hannover. The CC-206 is planned to be ready in early 2005. |
| JCM ist Mitglied der Deutschen Physikalischen Gesellschaft  |
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JCM ist Mitglied der Europäische Forschungsgesellschaft Dünne Schichten e.V.  | |||||||||||||
